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attosecond optics
Multilayer systems consisting of nanoscale metall or semiconductor layers serve as dispersive interference mirros for the XUV (∼30 eV – 100 eV) and soft X-ray (100 eV – 1000 eV) spectral range with normal incidence reflectivities up to 70%. We pursue the theoretical optimization (by needle optimization Fresnel codes), practical implementeation (by dual ion beam deposition technology) and characterization (by soft X-ray reflectrometry and attosecond streak camera recording) of these XUV multilayer mirrors as periodic or aperiodic, binary or ternary thin film structures with special emphasis on broad spectral bandwidth and spectral phase control, which is required for reflecting attosecond pulses.
Latest developments reach into the water-window spectral range (280 eV – 500 eV), with typically more than hundred pairs of nanometer layers and atomically smooth interface roughnesses in the 0.1 nm range.
Besides interference layer technology, laterally nanostructured diffractive optics (zone plates, gratings) for the XUV and soft X-ray range for application with sub-femtoscond XUV pulses are being developed by electron beam nanolithography.

contact : U. Kleineberglink to the personal page of Ulf Kleineberg
Fig. 1. TEM cross section of a Mo/B4C XUV multilayer coating as deposited by Dual Ion Beam Deposition. Note, that the single layer thicknesses are about 3 nm only, with atomically abrupt interfaces and 0.2 nm rms interfacial roughness (support by the TEM group of Prof. Bein (LMU) is acknowledged). (© Ulf Kleineberg)
Fig. 1. TEM cross section of a Mo/B4C XUV multilayer coating as deposited by Dual Ion Beam Deposition. Note, that the single layer thicknesses are about 3 nm only, with atomically abrupt interfaces and 0.2 nm rms interfacial roughness (support by the TEM group of Prof. Bein (LMU) is acknowledged). (© Ulf Kleineberg)