AS-3
AS-3 is a UHV attosecond beamline designed for attosecond spectroscopy of solid-state systems and surfaces. It is the result of a close collaboration between LAP scientists and Peter Feulner, Dietrich Menzel, Johannes Barth and coworkers from the TU Munich. The driver laser for AS3 is FP2, providing waveform-controlled, sub-3.5-fs NIR pulses at a repetition rate of 3 kHz
, with 400 µJ per pulse on the high-harmonic target, permitting the generation of isolated nanojoule-energy attosecond pulses over the spectral range of 50-150 eV. A flat-field spectrometer allows for inline monitoring of the XUV spectral distribution.
The beamline is differentially pumped, permitting operation at pressures ranging from 10^{-3} mbar (in the harmonic generation chamber) to 10^{-11} mbar (in the experimental chamber). The experimental chamber contains a double-mirror assembly to isolate and delay attosecond pulses, an imaging system to monitor the focus of the XUV and NIR pulses. The experimental chamber contains two detectors, a time-of-flight electron spectrometer and a hemispherical photoelectron spectrometer. Both detectors can be rotated with respect to the sample and the laser beam, which offers the possibility of performing angularly-resolved measurements. The sample is mounted on a manipulator with temperature control from 10 K to 2500 K.
The experimental chamber is connected to another UHV chamber for sample preparation and characterization. This preparation chamber is equipped with several tools such as a sputter gun, a gas shower, and evaporation sources in order to grow high quality metal surfaces or to deposit adsorbate layers. X-ray photoelectron spectroscopy (XPS) and low-energy electron diffraction (LEED) are available for surface characterization.
contact: R. Ernstorfer, R. Kienberger
, with 400 µJ per pulse on the high-harmonic target, permitting the generation of isolated nanojoule-energy attosecond pulses over the spectral range of 50-150 eV. A flat-field spectrometer allows for inline monitoring of the XUV spectral distribution.
The beamline is differentially pumped, permitting operation at pressures ranging from 10^{-3} mbar (in the harmonic generation chamber) to 10^{-11} mbar (in the experimental chamber). The experimental chamber contains a double-mirror assembly to isolate and delay attosecond pulses, an imaging system to monitor the focus of the XUV and NIR pulses. The experimental chamber contains two detectors, a time-of-flight electron spectrometer and a hemispherical photoelectron spectrometer. Both detectors can be rotated with respect to the sample and the laser beam, which offers the possibility of performing angularly-resolved measurements. The sample is mounted on a manipulator with temperature control from 10 K to 2500 K.
The experimental chamber is connected to another UHV chamber for sample preparation and characterization. This preparation chamber is equipped with several tools such as a sputter gun, a gas shower, and evaporation sources in order to grow high quality metal surfaces or to deposit adsorbate layers. X-ray photoelectron spectroscopy (XPS) and low-energy electron diffraction (LEED) are available for surface characterization.
contact: R. Ernstorfer, R. Kienberger
Fig. 1. The AS-3 beamline. (© thn)