optical multilayers
- thin-film coating
- spectrometry and loss measurement
- surface characterization
- dispersion measurement
- damage-threshold measurement
- electron microscopy / nanolithography
The instrumentation described below is available in the Service Centre of the Munich Centre for Advanced Photonics (MAP). Here we briefly present the state-of-the-art manufacturing facilities and measuring instruments, which are being permanently advanced and pushed to their limits to offer highest performance in terms of accuracy/reproducibility and dynamic-range/accuracy/resolution, respectively. These efforts along with the leading edge expertise and dedication of our staff allow the development and reproducible manufacture of the most demanding multilayer optical devices that current technology is able to afford. We can also produce nano-optical components. For more details please visit the webpage of the MAP Service Centre.
Thin film coating
Three state-of-the-art thin-film coating apparatus capable of depositing a variety of metallic and dielectric materials are being used for the development of a wide range of thin-film optics of highest quality for the spectral range extending from the infrared (wavelength ∼ several micrometres) to the soft-X-ray regime (several nanometres).
Thin film coating
Three state-of-the-art thin-film coating apparatus capable of depositing a variety of metallic and dielectric materials are being used for the development of a wide range of thin-film optics of highest quality for the spectral range extending from the infrared (wavelength ∼ several micrometres) to the soft-X-ray regime (several nanometres).
- Syrus (Leybold Optics): coating system based on electron-beam evaporation for the manufacturing of (quarterwave as well as chirped) multilayer optics for the visible and ultraviolet spectral range and for high-intensity applications.
- Helios (Leybold Optics): coating system based on magnetron sputtering for the manufacturing of (quarterwave as well as chirped) multilayer optics for the infrared and visible spectral range.
- Nexus (Veeco): ion-beam deposition system used for the manufacturing of multilayer optics for the extreme ultraviolet and soft-X-ray spectral range.
Spectrometry and loss measurement
Our Lambda-950 (Perkin Elmer) spectrophotometer allows precision transmitivity and reflectivity measurements over the spectral range spanning from the border of the vacuum ultraviolet (VUV) at 180 nm to the mid infrared (mid-IR) at about 3.3 μm. The absolute accuracy of transmission measurements is 0.1% and the maximal reflectivity that can be measured is 99.9%. At selected wavelengths: 808, 1030 and 1550 nm, our LossPro™ (Novawave Technologies) precision reflectometer and optical lossmeter offers much higher accuracy. It enables high performance optical components to be characterized with ultra-high precision. The system utilizes the proven cavity ringdown technique to determine reflectance and losses in thin films and optical substrates. Reflectance from 98 % to 99.9995 % or total optical loss ranging from 2 % to 0.0005 % can be determined with sub-ppm-level precision.
Our Lambda-950 (Perkin Elmer) spectrophotometer allows precision transmitivity and reflectivity measurements over the spectral range spanning from the border of the vacuum ultraviolet (VUV) at 180 nm to the mid infrared (mid-IR) at about 3.3 μm. The absolute accuracy of transmission measurements is 0.1% and the maximal reflectivity that can be measured is 99.9%. At selected wavelengths: 808, 1030 and 1550 nm, our LossPro™ (Novawave Technologies) precision reflectometer and optical lossmeter offers much higher accuracy. It enables high performance optical components to be characterized with ultra-high precision. The system utilizes the proven cavity ringdown technique to determine reflectance and losses in thin films and optical substrates. Reflectance from 98 % to 99.9995 % or total optical loss ranging from 2 % to 0.0005 % can be determined with sub-ppm-level precision.
Surface characterization
Surface quality is of critical importance for minimizing the losses and/or maximizing the damage threshold of our optical components. A Zygo interferometer operated at a wavelength of 632 nm and a home-built interferometer operated at 532 and 790 nm (both having a 150-mm aperture) are used for measuring the large-scale surface quality. With a Dektak 150 Stylus (Veeco) surface profiler we can scan the surface of our optics over a range up to 200 mm and measure surface roughness, film thicknesses with a resolution of several nanometres.
Surface quality is of critical importance for minimizing the losses and/or maximizing the damage threshold of our optical components. A Zygo interferometer operated at a wavelength of 632 nm and a home-built interferometer operated at 532 and 790 nm (both having a 150-mm aperture) are used for measuring the large-scale surface quality. With a Dektak 150 Stylus (Veeco) surface profiler we can scan the surface of our optics over a range up to 200 mm and measure surface roughness, film thicknesses with a resolution of several nanometres.
Dispersions measurements
We have developed a white-light interferometer (WLI) for characterization of dispersive optics. It is based on broad-band scanning Michelson interferometer and measures the group delay different spectral components suffer in the mirror under study. Our WLI currently covers the spectral range of 350 nm to 2.2 μm and permits measurement of the group-delay dispersion with an accuracy better than 10 fs² within this spectral range. This combination of spectral coverage and accuracy is currently unique in the world.
We have developed a white-light interferometer (WLI) for characterization of dispersive optics. It is based on broad-band scanning Michelson interferometer and measures the group delay different spectral components suffer in the mirror under study. Our WLI currently covers the spectral range of 350 nm to 2.2 μm and permits measurement of the group-delay dispersion with an accuracy better than 10 fs² within this spectral range. This combination of spectral coverage and accuracy is currently unique in the world.
Nano-lithography and nano-inspection
An electron-beam lithography system, RAITH200 (Fa. Raith GmbH) in a class 1000 cleanroom environment is dedicated to the development of sub-micron diffractive optics, metallic nanostructures and waveguides for plasmonic applications and optical microresonators. The system is based on a Schottky thermionic field-emitter scanning electron microscope for ultrahigh spatial resolution (5 nm) in the metrology mode and small electron beam diameter (2 nm @ 20 keV) and large current density (7500 A/cm²) in the lithography mode. The electron microscope is equipped with a 8 inch (200 mm) sample load lock, while ultra-precise sample positioning for overlay and stiching accuracy (< 40 nm 3σ) is provided by means of a laser-interferometer-controlled 8 inch sample stage and closed-loop piezo positioning (2-nm resolution).
An electron-beam lithography system, RAITH200 (Fa. Raith GmbH) in a class 1000 cleanroom environment is dedicated to the development of sub-micron diffractive optics, metallic nanostructures and waveguides for plasmonic applications and optical microresonators. The system is based on a Schottky thermionic field-emitter scanning electron microscope for ultrahigh spatial resolution (5 nm) in the metrology mode and small electron beam diameter (2 nm @ 20 keV) and large current density (7500 A/cm²) in the lithography mode. The electron microscope is equipped with a 8 inch (200 mm) sample load lock, while ultra-precise sample positioning for overlay and stiching accuracy (< 40 nm 3σ) is provided by means of a laser-interferometer-controlled 8 inch sample stage and closed-loop piezo positioning (2-nm resolution).
Damage-threshold measurement
For a complete characterization of the multilayer optical devices it is mandatory to investigate their damage threshold, especially when high-power applications are considererd. For this purpose we are currently developing a setup for measuring the damage threshold of such coatings on the 30 fs timecsale at 800 nm wavelength using a modified Femtopower Compact Pro (Femtolasers GmbH) Ti:Sapphire chirped-pulse amplifier system, which can deliver pulses at a repetition rate of 1kHz and a pulse energy of up to 1.5 mJ. The fully automated damage-threshold measurement assembly will be available in the near future.
contact: A. Apolonskiy
, U. Kleineberg, V. Pervak, Zs. Major
For a complete characterization of the multilayer optical devices it is mandatory to investigate their damage threshold, especially when high-power applications are considererd. For this purpose we are currently developing a setup for measuring the damage threshold of such coatings on the 30 fs timecsale at 800 nm wavelength using a modified Femtopower Compact Pro (Femtolasers GmbH) Ti:Sapphire chirped-pulse amplifier system, which can deliver pulses at a repetition rate of 1kHz and a pulse energy of up to 1.5 mJ. The fully automated damage-threshold measurement assembly will be available in the near future.
contact: A. Apolonskiy
, U. Kleineberg, V. Pervak, Zs. Major
Fig. 1. Nexus is an ion-beam deposition apparatus for manufacturing precision multilayer optics for the optical, extreme ultraviolet, and soft-x-ray domain, substrate size ≤ 6 inch, deposition of several hundred layers with atomic-scale (‹ 0.1 nm) interface accuracy.
Fig. 2. SYRUSpro-710 is an e-beam machine, equipped with a novel process control system with maximum automation.
Fig. 3. HELIOS is equipped with two magnetrons and a plasma source, providing thus plasma/ion assisted reactive dual magnetron sputtering. Short process time even for complex multilayer systems is enabled by high deposition rates.