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Dr. Jingquan Linresearch expertise and fields
- Actinic inspection of EUV lithography mask blank defects using Photoemission Electron Microscopy (PEEM)
- Low debris target laser plasma light source for EUV lithography
- High intensity femtosecond laser pulse generated plasma
- Table top soft-x-ray laser
current interests and projects
- Characterization of ultrafast nanoplasmonic field using PEEM
- Development of chirped broadband XUV multilayer mirror

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